EAG Laboratories has launched a new laboratory in China dedicated to improving materials, products and electronics. Newly built in Shanghai, this facility brings the most advanced imaging and surface analysis expertise and technology to China, providing manufacturers with direct access to scientific expertise in the analysis of physical structures, chemical properties and composition of materials.
 
The new lab offers advanced microscopy capabilities in TEM (FEI Themis Z) and Dual Beam FIB (Helios G4 HX & UC FIBs). For supporting advanced R&D, the Themis Z aberration corrected TEM is capable of ultra-high energy resolution and ultra-high sub-atomic spatial resolution for imaging and chemistry (EDS & EELS). In addition, the new lab broadens EAG Shanghai’s capabilities in Secondary Ion Mass Spectrometry (SIMS).